Open AccessKINETICS OF DOPANT ACCUMULATION IN THE ADSORPTION LAYER DURING MOLECULAR-BEAM EPITAXY
Author(s) -
Ю. Эрвье
Publication year - 2015
Publication title -
izvestiâ vysših učebnyh zavedenij. materialy èlektronnoj tehniki
Language(s) - English
Resource type - Journals
eISSN - 2413-6387
pISSN - 1609-3577
DOI - 10.17073/1609-3577-2013-2-4-10
Subject(s) - molecular beam epitaxy , dopant , kinetics , adsorption , layer (electronics) , epitaxy , materials science , molecular beam , optoelectronics , chemical engineering , chemistry , nanotechnology , doping , molecule , physics , organic chemistry , quantum mechanics , engineering