
Stress and Adhesion of CVD Grown Polycrystalline 3C–SiC Films on Silicon Substrates
Author(s) -
Татьяна Михайловна Ткачева,
Л. Д. Иванова,
К. Д. Демаков,
М. Н. Шахов
Publication year - 2015
Publication title -
izvestiâ vysših učebnyh zavedenij. materialy èlektronnoj tehniki
Language(s) - English
Resource type - Journals
eISSN - 2413-6387
pISSN - 1609-3577
DOI - 10.17073/1609-3577-2012-4-24-27
Subject(s) - materials science , silicon , polycrystalline silicon , substrate (aquarium) , silicon carbide , composite material , chemical vapor deposition , crystallite , heterojunction , optoelectronics , layer (electronics) , metallurgy , oceanography , geology , thin film transistor