Open AccessNONLINEAR MODEL PREDICTIVE CONTROL OF CHEMICAL PROCESSES
Author(s) -
R. G. Silva,
Wu Hong Kwong
Publication year - 1999
Publication title -
brazilian journal of chemical engineering/brazilian journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.313
H-Index - 52
eISSN - 1678-4383
pISSN - 0104-6632
DOI - 10.1590/s0104-66321999000100008
Subject(s) - equidistant , orthogonal collocation , discretization , model predictive control , collocation (remote sensing) , nonlinear system , algebraic equation , computation , computer science , mathematical optimization , collocation method , mathematics , algorithm , control theory (sociology) , differential equation , control (management) , ordinary differential equation , mathematical analysis , artificial intelligence , physics , geometry , quantum mechanics , machine learning
A new algorithm for model predictive control is presented. The algorithm utilizes a simultaneous solution and optimization strategy to solve the model's differential equations. The equations are discretized by equidistant collocation, and along with the algebraic model equations are included as constraints in a nonlinear programming (NLP) problem. This algorithm is compared with the algorithm that uses orthogonal collocation on finite elements. The equidistant collocation algorithm results in simpler equations, providing a decrease in computation time for the control moves. Simulation results are presented and show a satisfactory performance of this algorithm