Open AccessLithography Hotspot Detection
Author(s) -
Jea Woo Park
Publication year - 2017
Language(s) - Uncategorized
Resource type - Dissertations/theses
DOI - 10.15760/etd.3446
Subject(s) - lithography , next generation lithography , wafer , extreme ultraviolet lithography , photolithography , computational lithography , immersion lithography , chip , hotspot (geology) , optical proximity correction , x ray lithography , materials science , wavelength , computer science , optics , optoelectronics , electron beam lithography , nanotechnology , resist , telecommunications , physics , layer (electronics) , geophysics