Open AccessLithography Hotspot Detection
Author(s) -
JaeWoo Park
Publication year - 2017
Language(s) - Uncategorized
Resource type - Dissertations/theses
DOI - 10.15760/etd.3446
Subject(s) - lithography , next generation lithography , wafer , extreme ultraviolet lithography , photolithography , chip , computational lithography , optical proximity correction , hotspot (geology) , immersion lithography , x ray lithography , materials science , computer science , optics , electron beam lithography , optoelectronics , resist , nanotechnology , telecommunications , physics , layer (electronics) , geophysics
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