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Self‐Assembly in Evaporated Polymer Solutions: Patterning on Two Scales
Author(s) -
Bormashenko Edward,
Whyman Gene,
Pogreb Roman,
Stanevsky Oleg,
HakhamItzhaq Mordechai,
Gendelman Oleg
Publication year - 2008
Publication title -
israel journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.908
H-Index - 54
eISSN - 1869-5868
pISSN - 0021-2148
DOI - 10.1560/ijc.47.3-4.319
Subject(s) - mesoscopic physics , polymer , amorphous solid , chemistry , chemical physics , nanotechnology , substrate (aquarium) , self assembly , chemical engineering , crystallography , condensed matter physics , materials science , organic chemistry , physics , oceanography , geology , engineering
Self‐assembly processes in intensively evaporated polymer solutions, based on chlorinated solvents and amorphous polymers, have been investigated under low and high humidity. Patterning on two scales, mesoscopic and microscopic, has been revealed. The strong dependence of the characteristic size of a mesoscopic pattern on the polymer solution concentration is revealed and studied. Various possible mechanisms of patterning on the two scales are discussed. It has been shown that the widespread hypothesis of micro‐patterning induced with water droplets needs further justification. The influence of substrate defects on the mesoscopic patterning is also investigated.