Open AccessThe Validation of Various Technological Factors Impact on the Electron Beam Lithography Process
Author(s) -
Agnieszka Zawadzka,
Kornelia Indykiewic,
R. Paszkiewicz
Publication year - 2021
Publication title -
advances in electrical and electronic engineering/advances in electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.225
H-Index - 19
eISSN - 1804-3119
pISSN - 1336-1376
DOI - 10.15598/aeee.v19i2.4133
Subject(s) - electron beam lithography , process (computing) , lithography , electron , materials science , cathode ray , computer science , nanotechnology , optoelectronics , physics , resist , nuclear physics , layer (electronics) , operating system