Open AccessApplication of Cl2/BCl3/Ar Plasma Treatment in the Improvement of Ti/Al/Mo/Au Ohmic Contacts
Author(s) -
J. Gryglewicz,
Wojciech Macherzyński,
Andrzej Stafiniak,
Adam Paszkiewicz,
R. Paszkiewicz
Publication year - 2016
Publication title -
advances in electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.225
H-Index - 19
eISSN - 1804-3119
pISSN - 1336-1376
DOI - 10.15598/aeee.v14i2.1589
Subject(s) - ohmic contact , materials science , plasma , metallurgy , optoelectronics , composite material , physics , layer (electronics) , quantum mechanics
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