The Epitaxial Growth of Copper on the (111) Surface of Silicon
Author(s) -
F. J. Walker,
J. Conner,
R. A. McKee
Publication year - 1990
Publication title -
mrs proceedings
Language(s) - English
Resource type - Journals
eISSN - 1946-4274
pISSN - 0272-9172
DOI - 10.1557/proc-187-249
Subject(s) - materials science , high resolution transmission electron microscopy , epitaxy , silicon , copper , auger electron spectroscopy , alloy , electron diffraction , transmission electron microscopy , molecular beam epitaxy , silicide , crystallography , metallurgy , nanotechnology , diffraction , layer (electronics) , optics , chemistry , physics , nuclear physics
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