Open AccessA Mathematical Model of the Gas-Phase and Surface Chemistry in GaAs Mocvd
Author(s) -
Michael E. Coltrin,
Robert J. Kee
Publication year - 1989
Publication title -
mrs proceedings
Language(s) - English
Resource type - Journals
eISSN - 1946-4274
pISSN - 0272-9172
DOI - 10.1557/proc-145-119
Subject(s) - trimethylgallium , metalorganic vapour phase epitaxy , arsine , susceptor , chemical vapor deposition , materials science , gas phase , deposition (geology) , partial pressure , thermodynamics , liquid phase , mechanics , chemistry , chemical engineering , analytical chemistry (journal) , nanotechnology , epitaxy , physics , environmental chemistry , organic chemistry , paleontology , layer (electronics) , sediment , biology , oxygen , phosphine , engineering , catalysis
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