Open AccessX-Ray Lithography Studies of Polysilane using a Laser Plasma X-Ray Source
Author(s) -
Glenn D. Kubiak,
Duane A. Outka,
John M. Zeigler
Publication year - 1988
Publication title -
mrs proceedings
Language(s) - English
Resource type - Journals
eISSN - 1946-4274
pISSN - 0272-9172
DOI - 10.1557/proc-129-615
Subject(s) - dimethylsilane , materials science , x ray , laser linewidth , absorption (acoustics) , x ray lithography , lithography , analytical chemistry (journal) , plasma , laser , optics , resist , optoelectronics , nanotechnology , physics , chemistry , layer (electronics) , chromatography , quantum mechanics , polymer chemistry , composite material
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