Open AccessReview and perspective on ferroelectric HfO2-based thin films for memory applications
Author(s) -
Min Hyuk Park,
Young Hwan Lee,
Thomas Mikolajick,
Uwe Schroeder,
Cheol Seong Hwang
Publication year - 2018
Publication title -
mrs communications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.751
H-Index - 31
eISSN - 2159-6859
pISSN - 2159-6867
DOI - 10.1557/mrc.2018.175
Subject(s) - materials science , ferroelectricity , dielectric , engineering physics , hafnia , annealing (glass) , optoelectronics , oxide , nanotechnology , cubic zirconia , composite material , metallurgy , ceramic , engineering
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