Open AccessAssessing atomically thin delta-doping of silicon using mid-infrared ellipsometry
Author(s) -
Aaron M. Katzenmeyer,
Ting S. Luk,
Ezra Bussmann,
Steve M. Young,
Evan M. Anderson,
Michael Thomas Marshall,
James Anthony Ohlhausen,
Paul G. Kotula,
Ping Lu,
DeAnna Campbell,
TzuMing Lu,
Peter Q. Liu,
Daniel R. Ward,
Shashank Misra
Publication year - 2020
Publication title -
journal of materials research/pratt's guide to venture capital sources
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.788
H-Index - 148
eISSN - 0884-2914
pISSN - 0884-1616
DOI - 10.1557/jmr.2020.155
Subject(s) - materials science , ellipsometry , doping , infrared , silicon , thin film , optoelectronics , nanotechnology , analytical chemistry (journal) , optics , environmental chemistry , chemistry , physics
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