Open AccessGrowth of diamond by rf plasma-assisted chemical vapor deposition
Author(s) -
Duane Meyer,
N. J. Ianno,
John A. Woollam,
A. B. Swartzlander,
A. J. Nelson
Publication year - 1988
Publication title -
journal of materials research/pratt's guide to venture capital sources
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.788
H-Index - 148
eISSN - 0884-2914
pISSN - 0884-1616
DOI - 10.1557/jmr.1988.1397
Subject(s) - materials science , auger electron spectroscopy , diamond , chemical vapor deposition , analytical chemistry (journal) , scanning electron microscope , microprobe , raman spectroscopy , boron nitride , graphite , thin film , plasma enhanced chemical vapor deposition , mineralogy , nanotechnology , metallurgy , optics , composite material , chemistry , physics , chromatography , nuclear physics
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