Open AccessInfluence of Deposition Temperature and Heat Treatment on Silicon Nitride Coat ing Deposited by LPCVD
Author(s) -
LIAO Chun-Jing,
Dong Shao-Ming,
Jin Xi-Hai,
Jianbao Hu,
Xiangyu Zhang,
Huixia Wu
Publication year - 2019
Publication title -
journal of inorganic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.252
H-Index - 25
ISSN - 1000-324X
DOI - 10.15541/jim20190035
Subject(s) - materials science , chemical vapor deposition , silicon nitride , deposition (geology) , chemical engineering , silicon , optoelectronics , engineering physics , engineering , paleontology , sediment , biology
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