Open AccessLow-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target
Author(s) -
程奕天,
邱万奇,
周克崧,
刘仲武,
焦东玲,
钟喜春,
张辉
Publication year - 2019
Publication title -
wuji cailiao xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.252
H-Index - 25
ISSN - 1000-324X
DOI - 10.15541/jim20180473
Subject(s) - materials science , sputtering , deposition (geology) , chemical engineering , thin film , metallurgy , nanotechnology , paleontology , sediment , engineering , biology