Open AccessLow-temperature Deposition of α-Al2O3 Films by Reactive Sputtering Al+α-Al2O3 Target
Author(s) -
Yitian Cheng,
Wan-Qi QIU,
Ke-Song ZHOU,
Liu Hon,
Dongling Jiao,
Xichun Zhong,
Hui Zhang
Publication year - 2019
Publication title -
journal of inorganic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.252
H-Index - 25
ISSN - 1000-324X
DOI - 10.15541/jim20180473
Subject(s) - materials science , sputtering , deposition (geology) , chemical engineering , thin film , metallurgy , nanotechnology , paleontology , sediment , engineering , biology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom