Open AccessSurface Modified Alumina Particles and Their Chemical Mechanical Polishing (CMP) Behavior on C-plane (0001) Sapphire Substrate
Author(s) -
WeiLei Wang,
Weili Liu,
Bai Lin-Sen,
Song Zhang,
Junchao Huo
Publication year - 2017
Publication title -
wuji cailiao xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.252
H-Index - 25
ISSN - 1000-324X
DOI - 10.15541/jim20170036
Subject(s) - materials science , chemical mechanical planarization , polishing , substrate (aquarium) , sapphire , composite material , surface (topology) , plane (geometry) , optics , geometry , laser , oceanography , physics , mathematics , geology