Open AccessAPS Bias Voltage on Properties of HfO$lt;inf$gt;2$lt;/inf$gt; Laser Films Deposited by Reactive Plasma Ion Assisted Electron Evaporation
Author(s) -
Caixia Fu,
Yang Yong,
Yunfeng Ma,
Yuquan Wei,
Jiao Zheng,
Huang Zheng-Ren
Publication year - 2017
Publication title -
wuji cailiao xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.252
H-Index - 25
ISSN - 1000-324X
DOI - 10.15541/jim20160170
Subject(s) - materials science , evaporation , ion , plasma , laser , electron , voltage , analytical chemistry (journal) , biasing , optoelectronics , optics , electrical engineering , chemistry , physics , chromatography , nuclear physics , thermodynamics , engineering , organic chemistry