Open AccessAPS Bias Voltage on Properties of HfO$lt;inf$gt;2$lt;/inf$gt; Laser Films Deposited by Reactive Plasma Ion Assisted Electron Evaporation
Author(s) -
FU Chao-Li,
Yong Yang,
Yunfeng Ma,
Yuquan Wei,
Zheng Jiao,
HUANG Zheng-Ren
Publication year - 2016
Publication title -
journal of inorganic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.252
H-Index - 25
ISSN - 1000-324X
DOI - 10.15541/jim20160170
Subject(s) - materials science , evaporation , ion , plasma , laser , electron , voltage , analytical chemistry (journal) , biasing , optoelectronics , optics , electrical engineering , chemistry , physics , chromatography , nuclear physics , thermodynamics , engineering , organic chemistry
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