Open AccessSurface Plasmon Resonance in “Monolayer of Ni Nanoparticles/Dielectric Spacer/Au (Ni) Film” Nanostructure
Author(s) -
Oleg A. Yeshchenko,
Viktor V. Kozachenko,
Anastasiya V. Tomchuk
Publication year - 2018
Publication title -
ukrainian journal of physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 17
eISSN - 2071-0194
pISSN - 2071-0186
DOI - 10.15407/ujpe63.5.386
Subject(s) - materials science , nanoparticle , surface plasmon resonance , monolayer , dielectric , nanostructure , plasmon , absorption (acoustics) , permittivity , nickel , resonance (particle physics) , localized surface plasmon , analytical chemistry (journal) , optoelectronics , nanotechnology , composite material , chemistry , organic chemistry , physics , particle physics , metallurgy
The dual surface plasmon resonance in Ni nanoparticles in “monolayer of Ni nanoparticles/shellac film/Au (Ni) film” planar nanostructures has been observed in UV-vis absorption spectra. The dependences of the intensity, wavelength, and width of the dual SPR absorption peaks of Ni nanoparticles coupled with an Au (Ni) film on the spacer thickness have been studied in the range of spacer thicknesses of 12–43 nm. The main features of these dependences are an increase of the intensity, the blue shift, and the monotonic behavior of the widths of SPR absorption peaks at a decrease of the spacer thickness. The observed dependences have been rationalized as a result of the plasmonic coupling of the monolayer of Ni nanoparticles withthe metal film and the variation of the dielectric permittivity of the environment of Ni nanoparticles caused by the metal film presence. The stronger dependences of the SPR spectral characteristics of Ni nanoparticles have been observed in the nanostructure containing the gold film comparing to that with a nickel one. Such effect is due to the stronger coupling of Ni nanoparticles with an Au film, and the stronger influence of an Au film on the permittivity of the environment of Ni nanoparticles.