Open AccessTin-Induced Crystallization of Amorphous Silicon under Pulsed Laser Irradiation
Author(s) -
V. B. Neimash,
V. Melnyk,
L. Fedorenko,
P. E. Shepelyavyĭ,
V.V. Strilchuk,
A. S. Nikolenko,
Mykola Isaiev,
A.G. Kuzmych
Publication year - 2017
Publication title -
ukrainian journal of physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 17
eISSN - 2071-0194
pISSN - 2071-0186
DOI - 10.15407/ujpe62.09.0806
Subject(s) - materials science , tin , silicon , amorphous solid , amorphous silicon , laser , crystallization , irradiation , raman scattering , raman spectroscopy , optoelectronics , phase (matter) , fluence , laser power scaling , nanocrystalline silicon , optics , crystalline silicon , chemical engineering , crystallography , metallurgy , chemistry , physics , organic chemistry , nuclear physics , engineering