Open AccessRaman Scattering in the Process of Tin-Induced Crystallization of Amorphous Silicon
Author(s) -
V. B. Neimash,
Г. И. Довбешко,
P. E. Shepelyavyĭ,
Viktor Dan’ko,
V. Melnyk,
Mykola Isaiev,
Andrey Kuzmich
Publication year - 2016
Publication title -
ukrainian journal of physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 17
eISSN - 2071-0194
pISSN - 2071-0186
DOI - 10.15407/ujpe61.02.0143
Subject(s) - crystallization , materials science , raman scattering , raman spectroscopy , annealing (glass) , amorphous solid , silicon , tin , amorphous silicon , nanocrystal , chemical engineering , analytical chemistry (journal) , nanotechnology , optoelectronics , crystallography , crystalline silicon , optics , metallurgy , chemistry , physics , engineering , chromatography
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