Open AccessStructural properties of nanocomposite SiO2 (Si) films obtained by ion-plasma sputtering and thermal annealing
Author(s) -
O.L. Bratus,
А.А. Еvtukh,
O. S. Lytvyn,
Mykhailo V. Voitovych,
V.О. Yukhymchuk
Publication year - 2011
Publication title -
semiconductor physics, quantum electronics and optoelectronics/semiconductor physics quantum electronics and optoelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.185
H-Index - 2
eISSN - 1605-6582
pISSN - 1560-8034
DOI - 10.15407/spqeo14.02.247
Subject(s) - sputtering , nanocomposite , materials science , annealing (glass) , plasma , ion , thermal , composite material , nanotechnology , thin film , chemistry , thermodynamics , physics , nuclear physics , organic chemistry