Galvanic interconnects for thermoelectric cooling modules
Author(s) -
M.M. Krechun
Publication year - 2019
Publication title -
physics and chemistry of solid state
Language(s) - English
Resource type - Journals
eISSN - 2309-8589
pISSN - 1729-4428
DOI - 10.15330/pcss.20.1.88
Subject(s) - bismuth telluride , galvanic cell , thermoelectric effect , materials science , electroplating , thermoelectric cooling , bismuth , thermoelectric materials , metallurgy , nanotechnology , composite material , thermodynamics , thermal conductivity , physics , layer (electronics)
The paper studies the use of galvanic technologies in thermoelectricity. The technological features of applying anti-diffusion coatings on bismuth telluride based thermoelectric material (TEM) by electroplating method are considered. The advantages and disadvantages of the properties of anti-diffusion structures obtained by the electrochemical method are determined.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom