Open AccessChemical Polishig of CdTe and Solid Solution ZnxCd1-xTe and Cd0.2Hg0.8Te by the HNO3 – НІ – Glycerin Acid Aqueous Solutions
Author(s) -
E.E. Hvozdiyevskyi,
R.O. Denysyuk,
Vasyl Tomashyk,
Z. F. Tomashyк
Publication year - 2017
Publication title -
fìzika ì hìmìâ tverdogo tìla
Language(s) - English
Resource type - Journals
eISSN - 2309-8589
pISSN - 1729-4428
DOI - 10.15330/pcss.18.1.117-121
Subject(s) - dissolution , aqueous solution , cadmium telluride photovoltaics , solid solution , polishing , isotropic etching , etching (microfabrication) , chemistry , materials science , inorganic chemistry , metallurgy , nanotechnology , organic chemistry , layer (electronics)
The chemical dissolution of the CdTe, ZnxCd1-xTe and Cd0,2Hg0,8 solid solutions single crystals in the HNO3 – HI – glycerin aqueous solutions has been investigated. The etching rate dependences of the mentioned above materials versus the iodine and organic content in the compositions and the kinetic peculiarities of the chemical dissolution have been determined. It was established that the dissolution rate of the semiconductor solid solutions in the HNO3 – HI – glycerin etchant compositions decreases with the increasing of oxidizer and glycerin. Using experimental data, the compositions of polishing solutions and the conditions of chemical-dynamic polishing of the CdTe, ZnxCd1-xTe and Cd0,2Hg0,8Te surfaces have been optimized.