Open AccessRole of stress/strain mapping and random dopant fluctuation in advanced CMOS process technology nodes
Author(s) -
Taraprasanna Dash,
J. Jena,
E. Mohapatra,
S. Das,
S. Dey,
C. K. Maiti
Publication year - 2020
Publication title -
international journal of nano and biomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.112
H-Index - 11
eISSN - 1752-8941
pISSN - 1752-8933
DOI - 10.1504/ijnbm.2020.107413
Subject(s) - dopant , materials science , cmos , process (computing) , stress (linguistics) , strain (injury) , nanotechnology , optoelectronics , doping , engineering physics , computer science , engineering , medicine , linguistics , philosophy , operating system
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