Open AccessRole of stress/strain mapping and random dopant fluctuation in advanced CMOS process technology nodes
Author(s) -
T. P. Dash,
J. Jena,
E. Mohapatra,
Sanghamitra Das,
S. Dey,
C. K. Maiti
Publication year - 2020
Publication title -
international journal of nano and biomaterials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.112
H-Index - 11
eISSN - 1752-8941
pISSN - 1752-8933
DOI - 10.1504/ijnbm.2020.10029632
Subject(s) - materials science , dopant , cmos , stress (linguistics) , process (computing) , strain (injury) , nanotechnology , doping , optoelectronics , engineering physics , computer science , physics , linguistics , philosophy , medicine , operating system