Open AccessPlasma Power Effect on the Surfaces of a Quartz Crystal During Etching using Tetrafluoroethane Gas
Author(s) -
Masruroh Masruroh,
Mahardika Auditia Hanif,
Setyawan P. Sakti,
Dionysius Joseph Djoko Herry Santjojo
Publication year - 2017
Publication title -
international journal of technology
Language(s) - English
Resource type - Journals
ISSN - 2087-2100
DOI - 10.14716/ijtech.v8i8.721
Subject(s) - quartz , etching (microfabrication) , crystal (programming language) , materials science , plasma , power (physics) , plasma etching , composite material , computer science , physics , nuclear physics , thermodynamics , layer (electronics) , programming language
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