Open AccessUsing Solubility Parameter for Selection of Solvents for Thermo-Processed Polymer Positive Photoresist Masks Applied in “Lift-Off” Photolithography
Author(s) -
D Lysich
Publication year - 2017
Publication title -
vestnik ûžno-uralʹskogo gosudarstvennogo universiteta. seriâ, himiâ/vestnik ûžno-uralʹskogo gosudarstvennogo universiteta. seriâ himiâ
Language(s) - English
Resource type - Journals
eISSN - 2412-0413
pISSN - 2076-0493
DOI - 10.14529/chem170304
Subject(s) - photoresist , photolithography , hildebrand solubility parameter , polymer , solubility , lift (data mining) , materials science , resist , selection (genetic algorithm) , polymer chemistry , nanotechnology , chemistry , composite material , computer science , organic chemistry , artificial intelligence , layer (electronics) , data mining