Open AccessOptical Emission Spectroscopy of Magnethron Discharge Ar/Cu Plasma
Author(s) -
A. Murmantsev,
A. Veklich,
V. Boretskij,
A. P. Shapovalov,
A. A. Kalenyuk
Publication year - 2019
Publication title -
plasma physics and technology
Language(s) - English
Resource type - Journals
eISSN - 2336-2634
pISSN - 2336-2626
DOI - 10.14311/ppt.2019.1.87
Subject(s) - plasma , argon , materials science , sputter deposition , atomic physics , electron temperature , spectroscopy , sputtering , electron density , plasma parameters , electric discharge , plasma processing , plasma diagnostics , emission spectrum , excitation temperature , electrode , chemistry , thin film , nanotechnology , spectral line , physics , quantum mechanics , astronomy
Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is studied by optical emission spectroscopy. Such discharges are usually used as effective sources in sputtering or deposition processes. Vapor admixtures in argon plasma define mainly the temperature and electron density in such discharges. This is the feature, which is typically takes place in plasma of discharge between contacts/electrodes in switching devices of electric technology circuits.