Open AccessElectro-Optical Property of Plasma Enhanced Chemical Vapor Deposition ZnO:Al Films Influenced by Substrate Materials and Annealing Treatments
Author(s) -
Hong Liang,
Zhaoquan Chen,
Chunlai Xue,
W. S. Cheng,
Bai Yang,
Huihui Li,
Minghai Liu,
Xiwei Hu
Publication year - 2014
Publication title -
asian journal of chemistry/asian journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.145
H-Index - 34
eISSN - 0975-427X
pISSN - 0970-7077
DOI - 10.14233/ajchem.2014.17310
Subject(s) - chemistry , annealing (glass) , chemical vapor deposition , plasma , chemical engineering , substrate (aquarium) , thin film , plasma enhanced chemical vapor deposition , optoelectronics , nanotechnology , metallurgy , materials science , organic chemistry , physics , quantum mechanics , engineering , oceanography , geology