Open AccessElectrochemical Behaviour of Arsenic on Copper Deposition Reaction in the Low Copper Concentration Electrolyte
Author(s) -
Shaohua Chen,
Yi Ding,
Donglin Zhao,
LU Dao-rong,
Jiaquan Wang
Publication year - 2013
Publication title -
asian journal of chemistry/asian journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.145
H-Index - 34
eISSN - 0975-427X
pISSN - 0970-7077
DOI - 10.14233/ajchem.2013.oh68
Subject(s) - chemistry , copper , arsenic , electrochemistry , electrolyte , inorganic chemistry , deposition (geology) , electrode , organic chemistry , paleontology , sediment , biology