Open AccessFundamentals of Chemical Vapor Deposition of Atomic Layer Materials
Author(s) -
Taiki INOUE,
Shigeo Maruyama
Publication year - 2022
Publication title -
vacuum and surface science
Language(s) - English
Resource type - Journals
eISSN - 2433-5843
pISSN - 2433-5835
DOI - 10.1380/vss.65.169
Subject(s) - chemical vapor deposition , atomic layer deposition , materials science , layer (electronics) , nanotechnology , graphene , atomic units , transition metal , boron nitride , hexagonal boron nitride , deposition (geology) , transition layer , engineering physics , chemistry , physics , catalysis , organic chemistry , geology , paleontology , sediment , quantum mechanics
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