Open AccessField Emission Properties of Protrusions Fabricated by Sputter Etching of SUS420J2 Steel, Oxygen Free Copper and Ni Plates
Author(s) -
Takashi Kubo,
Keijiro Nakasa
Publication year - 2020
Publication title -
vacuum and surface science
Language(s) - English
Resource type - Journals
eISSN - 2433-5843
pISSN - 2433-5835
DOI - 10.1380/vss.63.542
Subject(s) - sputtering , materials science , copper , etching (microfabrication) , argon , field electron emission , sputter deposition , metallurgy , analytical chemistry (journal) , composite material , thin film , layer (electronics) , nanotechnology , atomic physics , chemistry , physics , quantum mechanics , electron , chromatography
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