Low–pressure Deposition of CoPtCr–SiO2 Granular Films by Ar＋O2 Reactive Sputtering Using CoPtCrSi Target | Zendy

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Low–pressure Deposition of CoPtCr–SiO<sub>2</sub> Granular Films by Ar＋O<sub>2</sub> Reactive Sputtering Using CoPtCrSi Target

Author(s) -

Shingo Sasaki,

Kim Kong Tham,

Shintaro Hinata,

Shin Saito

Publication year - 2018

Publication title -

vacuum and surface science

Language(s) - English

Resource type - Journals

eISSN - 2433-5843

pISSN - 2433-5835

DOI - 10.1380/vss.61.469

Subject(s) - sputtering , materials science , deposition (geology) , analytical chemistry (journal) , thin film , chemistry , nanotechnology , chromatography , paleontology , sediment , biology

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