Open AccessDesigning a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range
Author(s) -
Joseph Nilsen
Publication year - 2020
Publication title -
osa continuum
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 8
ISSN - 2578-7519
DOI - 10.1364/osac.412213
Subject(s) - optics , extreme ultraviolet lithography , materials science , wavelength , diffusion , range (aeronautics) , optoelectronics , laser , x ray optics , x ray , physics , composite material , thermodynamics