Open AccessDesigning a high-reflectivity normal-incidence Ge/Si multilayer X-ray mirror for the 44–50 nm wavelength range
Author(s) -
Joseph Nilsen
Publication year - 2020
Publication title -
osa continuum
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 8
ISSN - 2578-7519
DOI - 10.1364/osac.412213
Subject(s) - optics , extreme ultraviolet lithography , materials science , wavelength , optoelectronics , diffusion , range (aeronautics) , laser , absorption (acoustics) , x ray optics , x ray , physics , composite material , thermodynamics
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