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Simulation of the laser-induced oxidation process in fabricated Sn-MTMO grayscale photomasks
Author(s) -
Feng Xia,
Kun Zhang,
Shixia Li,
Maojin Yun,
Weijin Kong,
Xinzheng Zhang,
Qian Liu
Publication year - 2020
Publication title -
osa continuum
Language(s) - English
Resource type - Journals
ISSN - 2578-7519
DOI - 10.1364/osac.411797
Subject(s) - photomask , grayscale , materials science , laser , fabrication , optics , optoelectronics , nanotechnology , pixel , resist , physics , medicine , alternative medicine , layer (electronics) , pathology

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