Open AccessHighly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements
Author(s) -
Zhiwei Li,
Junming Shao,
Qian Luo,
Boping Lei,
Guohan Gao,
Jiang Bian,
Shibin Wu,
Bin Fan
Publication year - 2019
Publication title -
osa continuum
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 8
ISSN - 2578-7519
DOI - 10.1364/osac.2.003350
Subject(s) - figuring , aperture (computer memory) , reactive ion etching , etching (microfabrication) , optics , substrate (aquarium) , materials science , membrane , nanometre , blank , dry etching , deep reactive ion etching , ion , nanotechnology , physics , chemistry , acoustics , composite material , geology , oceanography , biochemistry , layer (electronics) , quantum mechanics