Open AccessSubmicrometer-scale pattern generation via maskless digital photolithography
Author(s) -
Minsu Kang,
Changhyun Han,
Heonsu Jeon
Publication year - 2020
Publication title -
optica
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 5.074
H-Index - 107
ISSN - 2334-2536
DOI - 10.1364/optica.406304
Subject(s) - photolithography , lithography , photomask , materials science , computer science , digital micromirror device , artificial intelligence , optoelectronics , nanotechnology , resist , layer (electronics)