Open AccessComprehensive modeling of near-field nano-patterning
Author(s) -
Raymond C. Rumpf,
Eric Johnson
Publication year - 2005
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.007198
Subject(s) - optics , holography , coherence (philosophical gambling strategy) , lithography , angular spectrum method , nano , field (mathematics) , coherence theory , materials science , physics , coherence length , diffraction , mathematics , quantum mechanics , pure mathematics , composite material , superconductivity
Near-field nano-patterning greatly simplifies holographic lithography, but deformations in formed structures are potentially severe. A fast and efficient comprehensive model was developed to predict geometry more rigorously. Numerical results show simple intensity-threshold methods do not accurately predict shape or optical behavior. By modeling sources with partial coherence, unpolarized light, and an angular spectrum, it is shown that standard UV lamps can be used to form 3D structures.