Open AccessMiniature Planar Solid Immersion Mirror with Focused Spot Less Than a Quarter Wavelength
Author(s) -
William A. Challener,
Christophe Mihalcea,
Chao Peng,
K. Pelhos
Publication year - 2005
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.007189
Subject(s) - optics , planar , materials science , wavelength , lithography , immersion lithography , microscope , photolithography , optoelectronics , immersion (mathematics) , resist , physics , computer science , nanotechnology , computer graphics (images) , mathematics , layer (electronics) , pure mathematics
We describe a microoptical planar waveguide solid immersion mirror with high optical throughput, and show that it can focus light to spot sizes of ~90 nm at a wavelength of 413 nm. Scanning near field optical microscope images of the light within the device are in good agreement with a simple theoretical model. This device is accurately mass-produced with lithographic and thin film deposition techniques known from modern integrated circuit processing.