Open AccessMathematical model of spin-coated photoresist on a spherical substrate
Author(s) -
Xiao Feng,
Limin Sun
Publication year - 2005
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.007070
Subject(s) - photoresist , substrate (aquarium) , optics , position (finance) , materials science , plane (geometry) , expression (computer science) , physics , geometry , nanotechnology , mathematics , computer science , oceanography , finance , layer (electronics) , economics , programming language , geology
We present the final film thickness' expression of spin-coated photoresist on a spherical substrate. Firstly, some reasonable assumptions are put forward for a concise derivation process. Then, on the basis of the motion equation of spin-coated photoresist on a plane, considering the spherical surface shape, we put forward the motion equation of spin-coated photoresist on a spherical substrate. So two evolution equations of film thickness and radial position are derived, and the expression of initial film thickness evolution in a radial position is also gained. Finally, considering some effects of solvent volatilization, we gain the expression of final film thickness. The experiment result indicates that the expression is accurate.