Open AccessNovel surface plasmon waveguide for high integration
Author(s) -
Liu Liu,
Zhanghua Han,
Sailing He
Publication year - 2005
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.006645
Subject(s) - materials science , surface plasmon , cladding (metalworking) , optics , surface plasmon polariton , waveguide , planar , trench , plasmon , optoelectronics , localized surface plasmon , etching (microfabrication) , isotropic etching , bending , nanotechnology , layer (electronics) , physics , computer graphics (images) , computer science , composite material , metallurgy
A novel surface plasmon waveguide structure is proposed for highly integrated planar lightwave circuits. By etching a small trench through a metallic thin film on a silica substrate, a guided mode with highly confined light fields is realized. The mode properties of the proposed structure are studied. The necessity of using a polymer upper-cladding is discussed. The coupling between two closely positioned waveguides and a 90o bending are also studied numerically. Sharp bending and high integration can be realized with the present surface plasmon waveguide. The proposed structure is easy to fabricate as compared with some other types of surface plasmon waveguides for high integration.