Open AccessSoft-lithography-based optical interconnection with high misalignment tolerance
Author(s) -
Junhao Wu,
Jing Cynthia Wu,
Junfeng Bao,
Xingkun Wu
Publication year - 2005
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.006259
Subject(s) - interconnection , lithography , optics , materials science , coupling (piping) , waveguide , coupling loss , optical interconnect , fabrication , process (computing) , electron beam lithography , computer science , optoelectronics , resist , optical fiber , nanotechnology , physics , telecommunications , operating system , medicine , alternative medicine , pathology , layer (electronics) , metallurgy
A low-cost, versatile optical coupling structure featuring a monolithic integration of a polymeric waveguide, beam ducts, and end-reflectors has been designed, prototyped, and demonstrated to be capable of sustaining high misalignment errors whilst maintaining a reasonable coupling efficiency. The soft lithography fabrication process of this interconnection design allows for significant advantages over traditional designs in terms of misalignment tolerance, manufacture cost and speed, as well as 3-D integration capability.