Open AccessRapid fabrication of large-area periodic structures containing well-defined defects by combining holography and mask techniques
Author(s) -
Ngoc Diep Lai,
Wenping Liang,
Jian Hung Lin,
Chia Chen Hsu
Publication year - 2005
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.005331
Subject(s) - photoresist , optics , materials science , photolithography , fabrication , holography , photonic crystal , lithography , laser , optoelectronics , lattice constant , beam (structure) , diffraction , nanotechnology , physics , medicine , alternative medicine , layer (electronics) , pathology
We demonstrate a promising method to fabricate large-area periodic structures with desired defects by using the combination of multiple-exposure two-beam interference and mask-photolithography techniques. Multiple-exposure of two-beam interference pattern at 325 nm into a positive AZ-4620 (or a negative SU-8) photopolymerizable photoresist is used to form a square and hexagonal two-dimensional periodic structures. Desired defects are introduced in these structures by irradiating the sample with one beam of the same laser through a mask in which the design of defects is patterned. A 1cm x 1cm periodic structures with the lattice constant as small as 365nm embedding several kinds of defect, such as waveguide or Mach-Zehnder, was obtained by employing this combination technique. It shows that the proposed combination technique is useful for mass production of photonic crystal optoelectronics devices.