Open AccessLow-voltage planar-waveguide electrooptic prism scanner in Crystal-Ion-Sliced thin-film LiNbO3
Author(s) -
Dj. S. Djukić,
Ryan M. Roth,
James T. Yardley,
Richard M. Osgood,
Sasha Bakhru,
H. Bakhru
Publication year - 2004
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.006159
Subject(s) - optics , materials science , prism , scanner , planar , wafer , thin film , lithium niobate , electric field , optoelectronics , voltage , pockels effect , poling , crystal (programming language) , etching (microfabrication) , ferroelectricity , laser , electrical engineering , dielectric , nanotechnology , physics , computer graphics (images) , engineering , layer (electronics) , quantum mechanics , computer science , programming language
We report on the use of thin, i.e. 10 microm-thick, single-crystal LiNbO3, in low-voltage electrooptic prism scanners. These devices are fabricated by electric-field poling of a series of electrooptic prisms in a bulk crystal followed by high-energy ion implantation and subsequent etching of the poled samples. Such a single-crystal thin-film scanner, while having the same scanning functionality as with a bulk device, has an order-of-magnitude reduction in its required voltage; for example, a series of two prisms, of 2mm in total length, yields a deflection angle of 0.7 at 100V compared to more than 1.7kV for the same device in standard 200 microm-thick LiNbO3 wafers.