Open AccessLow propagation loss of the waveguides in fused quartz by oxygen ion implantation
Author(s) -
Xuelin Wang,
KeMing Wang,
Gang Fu,
Shiling Li,
Ding–Yu Shen,
Hongyang Ma,
Rui Nie
Publication year - 2004
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.004675
Subject(s) - materials science , planar , annealing (glass) , ion , ion implantation , waveguide , optics , quartz , oxygen , wavelength , optoelectronics , prism , chemistry , computer graphics (images) , physics , organic chemistry , computer science , composite material
The planar waveguides have been fabricated in fused quartz by 3.0 MeV oxygen ion implantation at dose of 1x10;15 ions/cm2. The guiding modes were observed at wavelengths of both 633 nm and 1539 nm before and after annealing at 320 masculineC, 450 masculineC and 500 masculineC in 60 min characterized by the prism-coupling method. The width of the waveguide structure induced by oxygen ion implantation is about 3 microns. After suitable annealing, the minimum propagation loss of the waveguide in fused quartz can be reduced to -0.14 dB/cm.