Open AccessSpontaneously generated sinusoidallike structures on Ti-Ni thin film under focused ion-beam bombardment
Author(s) -
Yong Qing Fu,
Ngoi Kok Ann Bryan
Publication year - 2004
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.003707
Subject(s) - materials science , optics , wafer , grating , ion beam , thin film , focused ion beam , optoelectronics , silicon , substrate (aquarium) , microfabrication , diffraction grating , fabrication , raster scan , wavelength , beam (structure) , ion , nanotechnology , chemistry , medicine , physics , oceanography , organic chemistry , alternative medicine , pathology , geology
A new fabrication method for a sinusoidallike structure is described. The sinusoidal structure can be spontaneously self-formed on the surface of a substrate by focused ion-beam bombardment with raster scanning and an ion incident angle perpendicular to the sample surface (normal incidence). The substrate material is a silicon wafer coated with 2-mum-thick Ti-Ni thin film. We show by measurement and analysis of the grating characteristics at the working wavelength range from 50 to 1500 nm that the technique of self-organized formation is a valid approach for microfabrication of diffractive structures, and the spontaneously generated structure under ion bombardment is applicable for a sinusoidal grating that functions from the ultraviolet to the near-infrared wavelength range.