Open AccessDeposition and characterization of germanium sulphide glass planar waveguides
Author(s) -
ChungChe Huang,
Daniel W. Hewak,
John V. Badding
Publication year - 2004
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.002501
Subject(s) - germanium , materials science , refractive index , chemical vapor deposition , scanning electron microscope , raman spectroscopy , optics , deposition (geology) , thin film , prism , spectroscopy , analytical chemistry (journal) , optoelectronics , silicon , chemistry , nanotechnology , composite material , paleontology , physics , chromatography , quantum mechanics , sediment , biology
Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 microm/hr at 500oC. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5microm to 7microm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093+/-0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1+/-0.3 dB/cm.