Deposition and characterization of germanium sulphide glass planar waveguides | Zendy

ChungChe Huang | Zendy; Daniel W. Hewak | Zendy; John V. Badding | Zendy

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Deposition and characterization of germanium sulphide glass planar waveguides

Author(s) -

ChungChe Huang,

Daniel W. Hewak,

John V. Badding

Publication year - 2004

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/opex.12.002501

Subject(s) - germanium , materials science , refractive index , chemical vapor deposition , scanning electron microscope , raman spectroscopy , optics , deposition (geology) , thin film , prism , spectroscopy , analytical chemistry (journal) , optoelectronics , silicon , chemistry , nanotechnology , composite material , paleontology , physics , chromatography , quantum mechanics , sediment , biology

Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 microm/hr at 500oC. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5microm to 7microm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093+/-0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1+/-0.3 dB/cm.

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