Open AccessArbitrary micropatterning method in femtosecond laser microprocessing using diffractive optical elements
Author(s) -
Yutaka Kuroiwa,
Nobuhito Takeshima,
Yoshihiro Narita,
Shuhei Tanaka,
Kazuyuki Hirao
Publication year - 2004
Publication title -
optics express
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.001908
Subject(s) - femtosecond , optics , materials science , lens (geology) , laser , chromatic aberration , diffraction , focal length , diffraction efficiency , dispersion (optics) , optoelectronics , chromatic scale , physics
We successfully developed an arbitrary micro-patterning method with femtosecond pulses using a multi-level phase type diffractive optical element (DOE) and a focusing objective lens. The large chromatic dispersion effects of DOE resulting from the spectral bandwidth of femtosecond pulses can be reduced with the appropriate DOE focal length and the proper distance between the DOE and the focusing lens. The method was verified through optical and processing experiments. A partial periodic structure was formed at the designated position. Microstructures were precisely formed on the SiO2 glass surface and inside the glass by irradiating the constructed beam. The points were evenly dispersed with a separation of 5 mum.