Open AccessProduction of quasi-crystal template patterns using a dual beam multiple exposure technique
Author(s) -
Robert C. Gauthier,
A. L. Ivanov
Publication year - 2004
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.000990
Subject(s) - optics , photoresist , crystal (programming language) , materials science , interference (communication) , beam (structure) , rotation (mathematics) , photonic crystal , silicon , laser , optoelectronics , physics , nanotechnology , computer science , telecommunications , channel (broadcasting) , layer (electronics) , artificial intelligence , programming language
We present a dual beam multiple exposure technique that can generate complex 2-D quasi-crystal template structures. The optical system is based on the interference of two laser beams producing a family of high intensity planes. Controlled reorientation of a photosensitive sample between exposures results in an exposure dose, when developed, returns a quasi-crystal pattern. Results are shown in which quasi-crystal patterns with 8, 10, and 12-fold rotation symmetry are produced in photoresist. The results of several test runs are shown in which the quasi-crystal patterns developed in photoresist are subsequently etched into silicon. Based on an extended application of the dual beam multiple exposure optical system, a potential technique for producing 3-D quasi-crystal patterns is presented.