Exposure-schedule study of uniform diffraction efficiency for DSSM holographic storage | Zendy

Xiaosu Ma | Zendy; Qingsheng He | Zendy; Jinnan Wang | Zendy; Minxian Wu | Zendy; Guofan Jin | Zendy

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Exposure-schedule study of uniform diffraction efficiency for DSSM holographic storage

Author(s) -

Xiaosu Ma,

Qingsheng He,

Jinnan Wang,

Minxian Wu,

Guofan Jin

Publication year - 2004

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/opex.12.000984

Subject(s) - holography , diffraction efficiency , optics , multiplexing , diffraction , schedule , speckle pattern , multiple exposure , computer science , materials science , physics , telecommunications , operating system

An exposure-schedule theory of uniform diffraction efficiency for a Dynamic-Static speckle multiplexing (DSSM) volume holographic storage system is proposed. The overlap-factor (? overlap) is introduced into the system to compensate for the erasure effect of the static speckle multiplexing scheme. The exposure-schedule which is an inverse recursion formula is determined. Experimental results are obtained in a LiNbO(3):Fe crystal and 400 holograms with uniform diffraction efficiency are achieved by the use of the new exposure-schedule.

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