Open AccessExposure-schedule study of uniform diffraction efficiency for DSSM holographic storage
Author(s) -
Xiaosu Ma,
Qingsheng He,
Jinnan Wang,
MeiHwan Wu,
Guofan Jin
Publication year - 2004
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.12.000984
Subject(s) - holography , diffraction efficiency , optics , multiplexing , diffraction , schedule , speckle pattern , multiple exposure , computer science , materials science , physics , telecommunications , operating system
An exposure-schedule theory of uniform diffraction efficiency for a Dynamic-Static speckle multiplexing (DSSM) volume holographic storage system is proposed. The overlap-factor (? overlap) is introduced into the system to compensate for the erasure effect of the static speckle multiplexing scheme. The exposure-schedule which is an inverse recursion formula is determined. Experimental results are obtained in a LiNbO(3):Fe crystal and 400 holograms with uniform diffraction efficiency are achieved by the use of the new exposure-schedule.